Semiconductor Wafer Cleaning

1978-1989

  • Smith, O.D., U.S. Patent 4,085,059, April 18, 1978
    Foam Type Coating Remover
    (Verification that liquid phase and foam phase cleaning perform identically)
  • Griesshammer, R., U.S. Patent 4,156,619, May 29, 1979
    Process for Cleaning Semiconductor Discs
  • Ogaya, K., Japanese Patent Abstract 63-239820(A2), October 5, 1988
    Washing Method for Semiconductor Device
  • Leenaars, A.F.M., U.S. Patent 4,781,764, November 1, 1988
    Method of Removing Undesired Particles from a Surface of a Substrate
    (Experimental proof that bubbles can create a net zero surface tension particulate removal medium)
  • Liu, B.Y.H., U.S. Patent 4,817,652, April 4, 1989
    System for Surface and Fluid Cleaning

1990-1999

2000-2004